EDA in technology business? Designers want to discuss about?

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Nominations for EDA Industry’s Annual Phil Kaufman Award Open Through June 30
Award Sponsored by EDA Consortium, IEEE Council on EDA Honors Individuals Whose Contributions Impact EDA

SAN JOSE, Calif. and NEW YORK — May 18, 2011 — Nominations are being accepted now through Thursday, June 30, for the Phil Kaufman Award for Distinguished Contributions to Electronic Design Automation (EDA) sponsored by the EDA Consortium (EDAC) and the IEEE Council on Electronic Design Automation (CEDA).
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Last year’s recipient was Pasquale (Pat) O. Pistilli, chairman of MP Associates of Louisville, Colo., who pioneered the EDA industry and built the Design Automation Conference as its premiere showcase and networking platform.

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The award, to be presented at a dinner ceremony in October in Silicon Valley, Calif., recognizes individuals whose contributions made an impact within EDA in business, industry direction, promotion, technology and engineering, educational or mentoring. Areas of technology and engineering impact have been expanded this year to include: analog and RF; architecture, structures and FPGA; embedded systems; formal verification; design; design for manufacturing; intellectual property; layout; simulation; synthesis; and test. Impartiality is provided to all nominees, without regard to race, gender, age or national origin.
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Established in 1994, the award is in honor of EDA industry pioneer Phil Kaufman, who turned innovative technologies such as silicon compilation and emulation into businesses that have benefited electronic designers.
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The nomination form can be found at: http://www.edac.org/about_kaufman_award.jsp#nominations

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安森美半導體推出針對安捷倫科技ADS軟體的High-Q™ IPD工藝設計套件
- Y  ^2 v  }% b) v# @* G! o/ d完整的從前到後工序工藝設計套件(PDK)使兩家公司的客戶能充分利用業界最全面射頻及微波設計平台的優勢

2012年6月20日 – 應用於高能效電子產品的首要高性能矽方案供應商安森美半導體(ON Semiconductor，美國納斯達克上市代號：ONNN)宣佈提供針對公司High-Q™整合無源器件(IPD)工藝的完整從前到後工序工藝設計套件(PDK)。這PDK開發是為了配合安捷倫科技的先進設計系統(ADS) 2011電子設計輔助(EDA)軟體一起使用，使安森美半導體及安捷倫科技的客戶能夠充分利用業界最全面射頻(RF)及微波設計平台的優勢。
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安森美半導體的High-Q™ IPD工藝技術提供高電阻率矽銅(copper on high resistivity silicon)平台，非常適合用於生產無源器件，如用於便攜、無線及射頻應用的平衡-不平衡轉換器、濾波器、耦合器、雙工器及匹配網路。IPD技術用於安森美半導體在美國俄勒岡州Gresham的世界一流200 mm晶圓製造廠製造銅電感、精密電容及精密電阻。IPD為射頻系統級封裝提供高性價比方案。安森美半導體還為工程原型開發提供經濟合算的晶圓廠往返服務。此外，安森美半導體還提供多種應用定制規格的設計服務。

, N- V/ }/ z+ ^* X' k  |安森美半導體定制晶圓代工及IPD分部高級總監Rick Whitcomb說：「IPD工藝在射頻應用極受垂青，我們看到客戶極想要這工藝擴展至配合安捷倫的ADS平台。我們為客戶提供包括佈線和整合EM支援在內的完整ADS設計套件，他們便能利用安捷倫在射頻及微波設計領域經證明的專業知識之優勢。」
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- R3 V# U, t# e+ l$ Q為客戶提供的全功能ADS設計套件可用於佈線、模擬及驗證，支援電路圖驅使型佈線生成、佈線與電路圖對比檢驗、整合3D平面電磁及3D-FEM模擬器。
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$ ^" _$ {6 @! u/ q/ `7 U安捷倫科技EEsof EDA晶圓製造專案經理Juergen Hartung說：「ADS與IPD工藝完美匹配，ADS與安森美半導體IPD設計套件的組合使相互的客戶能夠獲得高效的整合設計平台。ADS不僅為IPD裸片本身提供完整的從前到後工序應用平台，還直接能設計出包含IPD的完整射頻模組。」